 Magnification: |
10-1500X for observation; 2-500X for 35mm photomicrography |
| Optical system: |
CFI60 (infinity optical system) Parfocal distance: 60mm |
| Eyepiece tube : |
Binocular tube; Trinocular tube "F", UW; Trinocular tube "T", UW; Ergonomic binocular tube; Siedentopf type (interpupilary distance: 50-75 mm); Eyelevel can be adjusted by eyelevel riser (thickness of 1 piece: 25 mm) |
| Eyepiece : |
10X (F.O.V.: 22mm), 10X M photo mask (F.O.V.: 22mm), 12.5X (F.O.V.: 14.5mm), UW 10X (F.O.V.: 25mm), UW 10X M photo mask (F.O.V. 25mm) |
| Photo lens : |
PLI projection lens: 2X, 2.5X, 4X, 5X |
| Nosepiece : |
Quintuple nosepiece fixed to main body |
| Coarse/fine focusing : |
Fine: 0.1mm per rotation. Coarse: 12.7mm per rotation; Minimum reading: 1 micron on left side knob; Coarse motion torque adjustable: Refocusing stopper incorporated; Stage handle and focusing knob are at equal distance from the operator |
| Stage : |
Super hard coated surface; Rectangular 160.5mm X 208.5mm surface stage, 78mm X 54mm cross travel range using low-positioned coaxial X and Y motion control knob on right-hand side |
| Substage : |
Fixed on main body; Vertical movement: 30mm |
| Illumination: |
6V 30W halogen lamp, precentered and prefocused; Auto photo preset switch |
| Filter : |
Up to 2 optional filters (dia. 45mm) mountable on field lens unit; Diffuser incorporated |
| Intermediate attachment : |
Epi-fluorescence illuminator (4 filter blocks mountable); Double port (2 ways: 100/0, 55/45); Teaching head; Drawing tube |
